Global Chemical Mechanical Planarization (CMP) Market Analysis, Drivers, Restraints, Opportunities, Threats, Trends, Applications, and Growth Forecast to 2027

MarketResearch.biz delivers in-depth insights on the global chemical mechanical planarization market in its upcoming report titled, “Global Chemical Mechanical Planarization (CMP) Market Trends, Applications, Analysis, Growth, and Forecast: 2017 to 2027”. The global chemical mechanical planarization market is estimated to register a CAGR of XX.X% during forecast period 2017–2027. The report offers in-depth insights, revenue details, and other vital information regarding the target market, and the various trends, drivers, restraints, opportunities, and threats till 2027. The report offers insightful and detailed information regarding the various key players operating in the CMP market, their financials, supply chain trends, products and related technological innovations, key developments, apart from current and future strategies, acquisitions & mergers, and market footprint. The global chemical mechanical planarization market report has been segmented on the basis of type, application, and region.

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This report is based on synthesis, analysis, and interpretation of information gathered regarding the target market from various reliable sources. Our analysts have analyzed the information and data and gained insights using a mix of primary and secondary research efforts, with the primary objective to provide a holistic view of the market. In addition, an in-house study has been made of the global economic conditions and other economic indicators and factors to assess their respective impact on the market historically, as well as the current impact in order to make more accurate and informed forecasts about the market scenario in future.

Chemical mechanical planarization (CMP) is a process used especially in semiconductor and electronics industry for smoothing of surfaces by using both chemical and mechanical forces.

A major factor driving growth of the global chemical mechanical planarization market is increasing demand from semiconductor industry. Increasing adoption of electronic products is another factor expected to fuel growth of the global market to a significant extent in the next 10 years. In addition, rising demand for microelectromechanical systems is another factor expected to further fuel growth of the global market over the forecast period. Major factor restraining growth of the global chemical mechanical planarization market is stringent government regulations and lack of standards on use of slurries and abrasives.

The market in Asia Pacific accounted for highest share in terms of revenue in the global chemical mechanical planarization market and is expected to maintain its dominance over the next 10 years. This dominance can be attributed to increasing demand from semiconductor and electronics industry in countries such as South Korea, Taiwan, Japan, and China in the region. North America market is expected to register significant growth during the forecast period, followed by Europe market. Moreover, the market in Latin America is expected to witness moderate growth over the forecast period.

Global Chemical Mechanical Planarization (CMP) Market Segmentation:

Segmentation on the basis of type:

• CMP equipment
• CMP consumables
  • Slurry
  • Pad
  • Pad conditioner
  • Others (cleaning solutions and PVA brushes)

Segmentation on the basis of application:

• Integrated Circuits
• Microelectromechanical systems (MEMS) and Nanoelectromechanical systems (NEMS)
• Compound semiconductors
• Optics

Segmentation on the basis of region:

• North America
• Europe
• Asia Pacific
• Latin America
• Middle East & Africa

• Applied Materials, Inc.
• Strasbaugh Inc.
• Lapmaster Wolters GmbH
• LAM Research Corporation
• Cabot Microelectronics Corporation
• Fujimi Incorporated
• Air Products & Chemicals Inc.
• Hitachi Chemical Company Ltd.
• Ebara Corporation
• Okamoto Machine Tool Works Ltd.
• DOW Electronic Materials